Modelling of Phosphorus and Boron Doping Concentration on SOI Wafer Based Diffusion Process

Sapteka, Anak Agung Ngurah Gde and Narottama, Anak Agung Ngurah Made and Yasa, Kadek Amerta (2020) Modelling of Phosphorus and Boron Doping Concentration on SOI Wafer Based Diffusion Process. Logic: Jurnal Rancang Bangun dan Teknologi, 20 (1). pp. 53-58. ISSN 1412114X

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Official URL: https://doi.org/10.31940/logic.v20i1.1748
Item Type: Article
Subjects: Ilmu Teknik > Teknik Elektro Dan Informatika > Teknik Elektro
Divisions: Jurusan Teknik Elektro > Prodi D4 Teknik Otomasi > Publikasi
Depositing User: Kadek Amerta Yasa
Date Deposited: 30 Apr 2023 06:55
Last Modified: 30 Apr 2023 16:29
URI: http://repository.pnb.ac.id/id/eprint/5418

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